Structure Sensitivity in Adsorption and Decomposition of NO on Ir
Structure Sensitivity in Adsorption and Decomposition of NO on Ir
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NO 在 Ir 上吸附和分解的结构敏感性
DOI:
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发表时间:
2008
期刊:
影响因子:
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通讯作者:
T. Jacob
中科院分区:
文献类型:
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作者:
Wenhua Chen;T. Madey;A. L. Stottlemyer;Jingguang G. Chen;P. Kaghazchi;T. Jacob
The adsorption and decomposition of NO on planar Ir(210) and nanofaceted Ir(210) with tunable facet sizes (5−14 nm) have been studied by means of temperature programmed desorption (TPD), high-resolution electron energy loss spectroscopy (HREELS), and density functional theory (DFT). Evidence has been found for structure sensitivity in adsorption sites and thermal decomposition of NO on planar Ir(210) versus those on faceted Ir(210). Both planar and faceted Ir(210) surfaces are very active for NO decomposition with high selectivity to N2. Heating NO-saturated planar Ir(210) leads to desorption of large amounts of N2 and small amounts of NO together with traces of N2O. Annealing NO-saturated faceted Ir(210) also produces large amounts of N2 and small amounts of NO without the formation of N2O. Adsorption of NO at 300 K on both surfaces is predominantly molecular. On planar Ir(210) NO adsorbs on atop sites for the entire NO coverage range. On faceted Ir(210) that contains (110) and {311} faces, NO adsorbs on...