Summary of research in NEDO Cat-CVD project in Japan
Summary of research in NEDO Cat-CVD project in Japan
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DOI：
10.1016/s0040-6090(01)01198-1
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发表时间：
2001-09-03
期刊：
影响因子：
2.1
通讯作者：
Matsumura, H
中科院分区：
文献类型：
--
作者：
Matsumura, H
本文综述了日本新能源产业技术开发机构（NEDO）资助的催化化学气相沉积（Cat-CVD）研究项目的最新进展。基于本课题的研究结果，首先讨论了催化化学气相沉积的沉积机理，以及制备沉积装置所需的基本问题。其次，Cat-CVD Si基薄膜，如非晶硅（a-Si），多晶硅（poly-Si），和氮化硅（SiNx）薄膜的性能进行了演示。最后讨论了这种薄膜在器件应用中的可行性。(C)2001 Elsevier Science B. V.保留所有权利。
This paper reviews the recent progress in the catalytic chemical vapor deposition (Cat-CVD) research project, supported by the New Energy and Industrial Technology Development Organization (NEDO). Based on the results obtained in the project, firstly, the deposition mechanism of Cat-CVD is discussed, together with fundamental issues required for making a deposition apparatus. Secondly, the properties of Cat-CVD Si-based thin films such as amorphous silicon (a-Si), polycrystalline silicon (poly-Si), and silicon nitride (SiNx) films are demonstrated. Finally, the feasibility of such films for device application is discussed. (C) 2001 Elsevier Science B.V. All rights reserved.