Generation and application of bessel beams in electron microscopy
Generation and application of bessel beams in electron microscopy
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DOI：
10.1016/j.ultramic.2016.03.009
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发表时间：
2016-07-01
期刊：
影响因子：
2.2
通讯作者：
Karimi, Ebrahim
中科院分区：
文献类型：
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作者：
Grillo, Vincenzo;Harris, Jeremie;Karimi, Ebrahim
我们报道了电子贝塞尔光束全息产生的系统处理，以期在电子显微镜中的应用。我们详细描述了全息图案化的理论基础，以及实验中使用的实际电子光学配置。我们发现，通过优化我们的纳米加工工艺，可以产生相对效率达到37+/-3%的电子贝塞尔光束。我们还通过调节不同的全息图参数，证明了电子贝塞尔光束可以产生许多可见光环，使它们成为干涉应用的理想形式，或者以更高的局域化形式，更少的光环，更适合成像。我们描述了以这种方式调整光束局部化所需的设置，并探索了允许控制电子贝塞尔光束的会聚和拓扑电荷的光束和全息图配置。我们还使用模拟程序表征了用我们的技术产生的贝塞尔光束的相位结构，该模拟程序解释了全息图制造过程中的缺陷。(C)2016爱思唯尔B.V.保留所有权利。
We report a systematic treatment of the holographic generation of electron Bessel beams, with a view to applications in electron microscopy. We describe in detail the theory underlying hologram patterning, as well as the actual electron-optical configuration used experimentally. We show that by optimizing our nanofabrication recipe, electron Bessel beams can be generated with relative efficiencies reaching 37 +/- 3%. We also demonstrate by tuning various hologram parameters that electron Bessel beams can be produced with many visible rings, making them ideal for interferometric applications, or in more highly localized forms with fewer rings, more suitable for imaging. We describe the settings required to tune beam localization in this way, and explore beam and hologram configurations that allow the convergences and topological charges of electron Bessel beams to be controlled. We also characterize the phase structure of the Bessel beams generated with our technique, using a simulation procedure that accounts for imperfections in the hologram manufacturing process. (C) 2016 Elsevier B.V. All rights reserved.