Cell attachment on silicon nanostructures

Cell attachment on silicon nanostructures
复制标题

DOI:
10.1116/1.589742
复制
发表时间:
1997-11-01
影响因子:
1.4
通讯作者:
Turner, J
Turner, J
中科院分区:
工程技术4区
文献类型:
--
作者:
Turner, S;Kam, L;Turner, J

文献摘要

被引文献

相似文献

神经探针技术的进步目前受到缺乏理解的线索和机制负责排斥和隔离探针植入中枢神经系统的阻碍。为了进一步深入了解这一主题,我们研究了星形胶质细胞在纳米级硅表面的附着。硅表面使用反应离子蚀刻工艺进行纹理处理,旨在在硅中产生纳米级柱状结构(“硅草”)。标准光刻技术用于表面图案,从而允许通过湿化学蚀刻对硅的表面纹理进行选择性修改。所得到的表面允许在培养中生长的细胞并排呈现不同的表面纹理。采用扫描电镜和扫描俄歇电镜对硅表面进行了表征。用激光扫描共聚焦显微镜和扫描电镜观察细胞的附着和形态。从连续细胞系转化的星形胶质细胞显示出对湿蚀刻区域的偏好。相比之下,新生大鼠的初级皮质星形胶质细胞表现出对硅草的偏好,而不是湿蚀刻表面。对于转化的星形胶质细胞,反应程度随湿蚀刻修饰程度的不同而连续。(C) 1997美国真空学会。
Advances in neural probe technology are currently hindered by a lack of understanding of the cues and mechanisms responsible for rejection and isolation of probes implanted in the central nervous system. To gain additional insight into this topic, the attachment of astrocytes on nanoscale textured silicon surfaces was investigated. Silicon surfaces were textured using a reactive ion etch process designed to produce nanometer-scale columnar structures in silicon ("silicon grass"). Standard photolithographic techniques were used to pattern the surface thereby allowing selective modification of the surface texture by a wet chemical etch for silicon. The resulting surface allowed a side-by-side presentation of different surface textures to cells grown in culture. The silicon surfaces were characterized by scanning electron microscopy (SEM) and scanning Auger electron microscopy. The cell attachment and morphology were observed with laser scanning confocal microscopy and SEM. Transformed astrocytes from a continuous cell line showed a preference for wet-etched regions over grassy regions. In contrast, primary cortical astrocytes from neonatal rats showed a preference for silicon grass over the wet-etched surface. For the transformed astrocytes cells, the degree of response was continuous with the degree of wet-etch modification. (C) 1997 American Vacuum Society.