QUANTUM-STATISTICAL ANALYSIS OF LOW-ENERGY SPUTTERING
QUANTUM-STATISTICAL ANALYSIS OF LOW-ENERGY SPUTTERING
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DOI：
10.1071/ph850125
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发表时间：
1985-01-01
期刊：
影响因子：
--
通讯作者：
WILHELM, HE
中科院分区：
文献类型：
--
作者：
WILHELM, HE
本文从理论上解释了多晶金属的低能表面溅射，提出了一种由入射离子和两个金属原子组成的三体溅射机制。用量子统计方法，从第一性原理导出了能量为E的离子平均溅射原子数S（E）的公式。理论与实验溅射数据在低能量区以上的阈值。作为应用，汞-金属原子散射截面的定量比较的理论和实验的S（E）值从不同的金属溅射汞离子。
Low energy surface sputtering of polycrystalline metals is explained theoretically by means of a three-body sputtering mechanism involving the impinging ion and two metal atoms. By means of quantum-statistical methods, a formula for the number S(E) of atoms sputtered on the average by an ion of energy E is derived from first principles. The theory agrees with experimental sputtering data in the low energy region above the threshold. As an application, mercury-metal atom scattering cross sections are determined by quantitative comparison of the theoretical and experimental S(E) values for sputtering mercury ions from various metals.