Realizing High Refractive Index Thiol-X Materials: A General and Scalable Synthetic Approach
Realizing High Refractive Index Thiol-X Materials: A General and Scalable Synthetic Approach
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DOI:
10.1021/acsmaterialslett.9b00331
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发表时间:
2019-11-01
影响因子:
11.4
通讯作者:
Bowman, Christopher N.
中科院分区:
文献类型:
--
作者:
Alim, Marvin D.;Mavila, Sudheendran;Bowman, Christopher N.
Photopolymers formed from the family of thiol-X "click" reactions notably form sulfur-containing thioether linkages. While sulfur-containing materials are conventionally expected to result in high refractive index (n(D)/20 degrees C > 1.6) materials, this expectation is rarely realized with thiol-X photopolymers, because of the lack of monomers with sufficiently high refractive indices. Here, an efficient, modular synthetic strategy to obtain high refractive index thiol-X monomers is presented. The efficacy of the overall approach is demonstrated using only commercially available starting compounds to yield low viscosity ( 1.64). These synthesized monomers underwent rapid thiol-ene photopolymerizations to high conversions, achieving refractive index values (n(D)/20 degrees C) up to 1.669 in uniform crosslinked networks exhibiting typical narrow and well-defined loss tangent (tan delta) peaks. The convenience of the low-viscosity, high optical quality thiol-ene resins was demonstrated in the fabrication of two functional optical components. First, a plano-convex lens was aspherized using an overmolding procedure. Second, a two-dimensional grating was fabricated using a two-stage material and a photomask exposure.