Parallel direct laser writing in three dimensions with spatially dependent aberration correction
Parallel direct laser writing in three dimensions with spatially dependent aberration correction
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DOI：
10.1364/oe.18.021090
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发表时间：
2010-09-27
期刊：
影响因子：
3.8
通讯作者：
Booth, Martin J.
中科院分区：
文献类型：
--
作者：
Jesacher, Alexander;Booth, Martin J.
我们提出了一种全息图设计过程，旨在减少平行三维直接激光写入应用中的像差。这种方法的一个原则是在保持平行化程度的同时最小化全息图的衍射率。这减少了由色差引起的焦点失真。我们解决了相关的问题，例如，由于显微镜物镜的浸没介质和制造衬底之间的潜在折射率不匹配而引起的零衍射级和像差。给出了在金刚石、熔融二氧化硅和铌酸锂中制备的结果。(C)2010年美国光学学会
We propose a hologram design process which aims at reducing aberrations in parallel three-dimensional direct laser writing applications. One principle of the approach is to minimise the diffractive power of holograms while retaining the degree of parallelisation. This reduces focal distortion caused by chromatic aberration. We address associated problems such as the zero diffraction order and aberrations induced by a potential refractive index mismatch between the immersion medium of the microscope objective and the fabrication substrate. Results from fabrication in diamond, fused silica and lithium niobate are presented. (C) 2010 Optical Society of America