Two-photon lithography for 3D magnetic nanostructure fabrication
Two-photon lithography for 3D magnetic nanostructure fabrication
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DOI：
10.1007/s12274-017-1694-0
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发表时间：
2018-02-01
期刊：
影响因子：
9.9
通讯作者：
Ladak, Sam
中科院分区：
文献类型：
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作者：
Williams, Gwilym;Hunt, Matthew;Ladak, Sam
几十年来，铁磁材料一直被用作数据存储设备中的记录介质。将材料限制在二维平面是实现超高记录密度的一个重要瓶颈，这导致了利用沿着纳米线的畴壁传播的三维（3D）赛道存储器的提议。然而，复杂几何形状的 3D 磁性纳米结构的制造极具挑战性，并且使用标准光刻技术不容易实现。在这里，我们展示了一种结合双光子光刻和电化学沉积构建复杂几何形状 3D 磁性纳米结构的新方法。人们发现磁性与结构的 3D 几何形状密切相关，并且磁成像实验提供了 3D 纳米结构结处磁畴壁钉扎的证据。
Ferromagnetic materials have been utilized as recording media in data storage devices for many decades. The confinement of a material to a two-dimensional plane is a significant bottleneck in achieving ultra-high recording densities, and this has led to the proposition of three-dimensional (3D) racetrack memories that utilize domain wall propagation along the nanowires. However, the fabrication of 3D magnetic nanostructures of complex geometries is highly challenging and is not easily achieved with standard lithography techniques. Here, we demonstrate a new approach to construct 3D magnetic nanostructures of complex geometries using a combination of two-photon lithography and electrochemical deposition. The magnetic properties are found to be intimately related to the 3D geometry of the structure, and magnetic imaging experiments provide evidence of domain wall pinning at the 3D nanostructured junction.