Ultracompact/ultralow power electron cyclotron resonance ion source for multipurpose applications.
Ultracompact/ultralow power electron cyclotron resonance ion source for multipurpose applications.
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适用于多用途应用的超紧凑/超低功率电子回旋共振离子源。
DOI：
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发表时间：
2010
影响因子：
1.6
通讯作者：
T. Thuillier
中科院分区：
文献类型：
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作者：
P. Sortais;T. Lamy;J. Medard;J. Angot;L. Latrasse;T. Thuillier
为了大幅度降低微波离子源的功耗，我们研究了一些特定的放电腔的几何形状，以降低工作点低于1 W的微波功率（在2.45 GHz）。我们表明，这是可能的，以驱动电子回旋共振离子源与发射机技术类似的用于手机。通过减小体积和所需微波功率，我们研制了一种新型的超低成本离子源。这种微波放电系统（称为COMIC，用于COmpact Microwave和Coaxial）可以用作光源，等离子体或离子。我们将展示导电腔的几何形状，在20 mm直径的腔室中，可以将等离子体的点火降低到100 mW以下，并定义约5 W的典型工作点。在一个简单的真空室内，很容易将源及其提取系统放置在任何地方，并完全处于真空状态。在这种情况下，已经观察到0.1至10 mA/cm（2）的电流密度（Ar，提取4 mm，1 mAe，20 kV）。初步的测量和计算表明，与两个电极系统，以提取低发射度内的光束的可能性。这些离子源的第一个应用是用于电荷繁殖、表面分析系统和表面处理的离子注入。为此，使用非常小的引出孔（对于具有2 W HF功率的3微安引出电流，典型地为3/10 mm）。质谱和发射度测量将被提交。在这些条件下，在15 kV（1 sigma）下观察到的值低至1 π mm mrad，因此非常接近目前观察到的表面电离源。这种方法的一个主要兴趣是将几个COMIC设备连接在一起的可能性。我们将介绍一些正在进行中的新发展，例如高压注入平台的源，ISOLDE的全石英放射性离子源或用于等离子体浸没的大型等离子体发生器，宽束或带状束的产生。
In order to drastically reduce the power consumption of a microwave ion source, we have studied some specific discharge cavity geometries in order to reduce the operating point below 1 W of microwave power (at 2.45 GHz). We show that it is possible to drive an electron cyclotron resonance ion source with a transmitter technology similar to those used for cellular phones. By the reduction in the size and of the required microwave power, we have developed a new type of ultralow cost ion sources. This microwave discharge system (called COMIC, for COmpact MIcrowave and Coaxial) can be used as a source of light, plasma or ions. We will show geometries of conductive cavities where it is possible, in a 20 mm diameter chamber, to reduce the ignition of the plasma below 100 mW and define typical operating points around 5 W. Inside a simple vacuum chamber it is easy to place the source and its extraction system anywhere and fully under vacuum. In that case, current densities from 0.1 to 10 mA/cm(2) (Ar, extraction 4 mm, 1 mAe, 20 kV) have been observed. Preliminary measurements and calculations show the possibility, with a two electrodes system, to extract beams within a low emittance. The first application for these ion sources is the ion injection for charge breeding, surface analyzing system and surface treatment. For this purpose, a very small extraction hole is used (typically 3/10 mm for a 3 microA extracted current with 2 W of HF power). Mass spectrum and emittance measurements will be presented. In these conditions, values down to 1 pi mm mrad at 15 kV (1sigma) are observed, thus very close to the ones currently observed for a surface ionization source. A major interest of this approach is the possibility to connect together several COMIC devices. We will introduce some new on-going developments such as sources for high voltage implantation platforms, fully quartz radioactive ion source at ISOLDE or large plasma generators for plasma immersion, broad or ribbon beams generation.