Multi-structure ion sensitive field effect transistor with a metal light shield
Multi-structure ion sensitive field effect transistor with a metal light shield
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DOI:
10.1016/s0925-4005(99)00036-2
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发表时间:
1999-12-14
影响因子:
8.4
通讯作者:
Hsiung, SK
中科院分区:
文献类型:
--
作者:
Liao, HK;Wu, CL;Hsiung, SK
It is known that light sensitivity in ion sensitive field effect transistors (ISFETs) during illumination is due to carrier generation in the silicon substrate. In order to improve this drawback, multi-structure ISFETs: tin oxide/Al/insulator/Si ISFET devices are investigated in this study. In this structure, aluminum is used as a light shield, and the tin oxide is used as a pH sensitive layer. We have developed SnO2/Si3N4/SiO2/Si ISFETs and SnO2/Al/Si3N4/SiO2/Si ISFETs, respectively. The pH sensitivity of these devices was measured and the data shows that the SnO2/Al/S3N4/SiO2/Si ISFET sensors have a linear pH response of about 56-58 mV/pH in a concentration range between pH2 and pH10 under room light conditions. Subsequently, the light sensitivity of the ISFETs with/without aluminum as a light shield were investigated under 2000 lx white light exposure. The data show that ISFETs with aluminum as a light shield have low light sensitivity compared with ISFETs without aluminum as a light shield. (C) 1999 Elsevier Science S.A. All rights reserved.