Grating Substrates Fabricated by Nanoimprint Lithography for Fluorescence Microscopy
Grating Substrates Fabricated by Nanoimprint Lithography for Fluorescence Microscopy
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DOI：
10.1143/jjap.48.06fh17
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发表时间：
2009-06-01
影响因子：
1.5
通讯作者：
Nishii, Junji
中科院分区：
文献类型：
--
作者：
Akashi, Naoko;Tawa, Keiko;Nishii, Junji
采用纳米压印技术制备了具有亚波长周期的塑料光栅基片，并将其应用于光栅耦合表面等离子体共振（GC-SPR）场增强荧光测量和荧光显微观察。光栅的制作采用了热近红外和紫外近红外技术。后一种工艺制作的光栅具有比前一种工艺上级的等离子体耦合特性。荧光检测结果表明，热近红外和紫外近红外两种方法制备的纳米结构的差异影响了荧光的增强。此外，用UV近红外制作的沟槽深度为39 nm的光栅衬底产生了SPR凹陷，并且发现这种光栅衬底的SPR依赖于占空比。严格耦合波分析（RCWA）的结果支持实验结果。用紫外近红外线制作的槽深为39 nm的光栅的占空比为0.6 ~ 0.8。(C)2009日本应用物理学会
In this study, plastic grating substrates with subwavelength period were fabricated by nanoimprint lithography (NIL) and applied for the measurements of grating coupled-surface plasmon resonance (GC-SPR) field-enhanced fluorescence and fluorescence microscopic observation. Thermal and UV NIL were used for the fabrication of gratings. The grating fabricated by the latter process exhibited superior plasmon coupling characteristics to the former. The result of fluorescence detection indicated that the difference between the two structures fabricated by thermal and UV NIL affected the enhancement of fluorescence. Furthermore, the grating substrate with 39 nm groove depth fabricated by UV NIL produced an SPR dip, and it was found that the SPR of this grating substrate was dependent on duty ratio. The results of rigorous coupled wave analysis (RCWA) supported the experimental results well. The appropriate duty ratio of the grating fabricated by UV NIL with 39nm groove depth was 0.6 to 0.8. (C) 2009 The Japan Society of Applied Physics