Nitrogen atoms in ArN2 flowing microwave discharges for steel surface nitriding

Nitrogen atoms in ArN2 flowing microwave discharges for steel surface nitriding
复制标题

ArN2 中的氮原子流动微波放电用于钢表面渗氮

DOI:
10.1016/0921-5093(91)90586-c
复制
发表时间:
1991
影响因子:
6.4
通讯作者:
H. Michel
H. Michel
中科院分区:
材料科学1区
文献类型:
--
作者:
A. Ricard;J. Deschamps;J. Godard;L. Falk;H. Michel

文献摘要

被引文献

相似文献

高氮原子密度(1015- 1016 cm-3)已经在高压(20-760 Torr)Ar 10 N2流后放电中产生。气体电离由2.45 GHz的surfatron和surfaguide激发器进行,发射功率为100-200 W。用NO硝化法和N2第一正系统的绝对强度测量了氮原子,发现氮原子的复合速率系数随气体温度从(4±1)× 10− 33 cm 6s − 1atT 0 = 296 K降低到1.3 × 10− 33 cm 6s − 1atT 0 = 600 K。在T = 700 K时,氮原子密度保持在2倍以内.在后放电反应器中,γ′-Fe 4 N涂层厚度随氮原子密度的增加而增加。
High nitrogen atom densities (1015–1016cm−3) have been produced in high pressure (20–760 Torr) ArN2flowing post-discharges. Gas ionization is performed by 2.45 GHz surfatron and surfaguide exciters with 100–200 W transmitted power. Nitrogen atoms have been measured by NO nitration and by the absolute intensities of the first positive system of N2in the analysis the nitrogen atom recombination rate coefficient has been found to decrease with gas temperature from (4±1) × 10−33cm6s−1atT0= 296 K to 1.3 × 10−33cm6s−1atT0= 600 K. The nitrogen atom density remains constant within a factor of 2 atT= 700 K. An increase ofγ′-Fe4N coating thickness with nitrogen atom density in the post-discharge reactor is reported.