The scaling behavior of sputtered Ni3Al coatings with and without Pt modification
The scaling behavior of sputtered Ni3Al coatings with and without Pt modification
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DOI：
10.1016/j.corsci.2012.01.008
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发表时间：
2012-05-01
影响因子：
8.3
通讯作者：
Wang, Fuhui
中科院分区：
文献类型：
--
作者：
Niu, Jianmin;Wang, Wen;Wang, Fuhui
采用磁控溅射法在Ni 3Al基高温合金IC 6上沉积了Ni 3Al纳米晶薄膜。Pt-改性的涂层，通过电镀1.5 μ m的铂到溅射的Ni 3Al膜退火和不退火。在1050 ℃下等温暴露20 h后，溅射的Ni 3Al膜上形成双重氧化皮。Pt改性涂层体系中Al发生了向上扩散，阻止了Al从涂层向基体的向内扩散。铂促进了Al的选择性氧化，尽管5at. Pt不足以在Pt改性的溅射γ ′-Ni 3Al涂层上形成专有的氧化铝氧化皮。(C)2012爱思唯尔有限公司保留所有权利。
A Ni3Al nanocrystalline film was deposited on the Ni3Al-based superalloy IC6 by magnetron sputtering. Pt-modified coatings were obtained by electroplating 1.5 mu m platinum onto the sputtered Ni3Al film with and without annealing. Duplex scale developed on the sputtered Ni3Al film after 20 h isothermal exposure at 1050 degrees C. Uphill diffusion of Al occurred in the Pt-modified coating system, which implied that inward diffusion of Al from coating to substrate was prevented. Platinum promoted selective oxidation of Al, although 5 at.% Pt was insufficient for the development of exclusive alumina scale on the Pt-modified sputtered gamma'-Ni3Al coating. (C) 2012 Elsevier Ltd. All rights reserved.