Controlled vapor deposition approach to generating substrate surface energy/chemistry gradients.
Controlled vapor deposition approach to generating substrate surface energy/chemistry gradients.
复制标题
产生基材表面能/化学梯度的受控气相沉积方法。
DOI:
10.1063/1.3594104
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发表时间:
2011
期刊:
影响因子:
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通讯作者:
Thomas H. Epps
中科院分区:
文献类型:
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作者:
Julie N. L. Albert;Joey D. Kim;C. Stafford;Thomas H. Epps
Substrate surface energy/chemistry gradients provide a means for high-throughput exploration of the surface interactions that are important in many chemical and biological processes. We describe the implementation of a controlled vapor deposition approach to surface modification that enables the facile production of substrate surface energy/chemistry gradients while maintaining versatility in both the gradient profile and the surface chemistry. In our system, gradient formation relies on the cross-deposition of functionalized chlorosilanes onto the substrate surface via vaporization of the deposition materials from liquid reservoirs under dynamic vacuum. The effects of liquid reservoir size (reservoir surface area), reservoir position relative to the substrate, vacuum application, and volatility of the deposition materials are examined in detail and demonstrate the level of gradient tunability afforded by this vapor deposition approach.