Direct nanoimprint lithography of polyethersulfone using cellulose-based mold

Direct nanoimprint lithography of polyethersulfone using cellulose-based mold
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使用纤维素基模具直接纳米压印聚醚砜

DOI:
10.1002/mame.201900853
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发表时间:
2020
影响因子:
3.9
通讯作者:
Satoshi Takei
Satoshi Takei
中科院分区:
材料科学3区
文献类型:
--
作者:
Takei Satoshi;Yasuda Kaori;竹井敏;Satoshi Takei

文献摘要

相似文献

聚醚砜(PES)玻璃化转变温度为224℃,是一类具有优异耐热性、力学性能、电学性能和光学性能的高性能超级工程塑料。然而,在高温下利用热压印光刻技术实现PES的纳米化会带来技术上的困难。在直接热压印光刻中,使用溶剂渗透型纤维素基模具和二甲基甲酰胺作为稀释剂,制作了高精度的900 nm PES线条图案50次。稀释剂在PES中的使用还局限于纳米压印光刻,所开发的工艺扩大了超级工程塑料的表面图案化。
Polyethersulfone (PES) with a glass transition temperature of 224 °C is a class of high‐performance super engineering plastics with excellent heat resistance, as well as mechanical, electrical, and optical properties. However, the nanopatterning of PES using thermal nanoimprint lithography at a high temperature can induce technical difficulties. High‐accuracy 900‐nm line patterning of PES is fabricated 50 times using both a solvent‐permeable cellulose‐based mold and dimethylformamide as a dilution solvent in direct thermal nanoimprint lithography. The use of dilution solvents in PES has yet been limited in the nanoimprint lithography, and the developed processes expand the surface patterning of super engineering plastic.