Evaporation of a thin droplet on a thin substrate with a high thermal resistance
Evaporation of a thin droplet on a thin substrate with a high thermal resistance
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DOI：
10.1063/1.3121214
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发表时间：
2009-05-01
影响因子：
4.6
通讯作者：
Sefiane, K.
中科院分区：
文献类型：
--
作者：
Dunn, G. J.;Wilson, S. K.;Sefiane, K.
建立了薄液滴在薄衬底上准稳态蒸发的数学模型，该模型考虑了液滴自由表面蒸汽饱和浓度对温度的依赖关系，用来研究衬底相对于液滴具有高热阻(即高度绝缘性和/或相对于液滴较厚)的非典型情况。在这种情况下，热在衬底中的扩散是限速蒸发过程，在前级，局部质量通量在空间上是均匀的，总蒸发率与液滴的表面积成正比，液滴被均匀冷却。特别强调了在这种情况下，本模型的预测结果与广泛使用的饱和浓度与温度无关的“基本”模型的预测结果之间的定性差异。
A mathematical model for the quasisteady evaporation of a thin liquid droplet on a thin substrate that incorporates the dependence of the saturation concentration of vapor at the free surface of the droplet on temperature is used to examine an atypical situation in which the substrate has a high thermal resistance relative to the droplet (i.e., it is highly insulating and/or is thick relative to the droplet). In this situation diffusion of heat through the substrate is the rate-limiting evaporative process and at leading order the local mass flux is spatially uniform, the total evaporation rate is proportional to the surface area of the droplet, and the droplet is uniformly cooled. In particular, the qualitative differences between the predictions of the present model in this situation and those of the widely used "basic" model in which the saturation concentration is independent of temperature are highlighted.