Prototyping of masks, masters, and stamps/molds for soft lithography using an office printer and photographic reduction
Prototyping of masks, masters, and stamps/molds for soft lithography using an office printer and photographic reduction
复制标题
DOI：
10.1021/ac991343m
复制
发表时间：
2000-07-15
影响因子：
7.4
通讯作者：
Whitesides, GM
中科院分区：
文献类型：
--
作者：
Deng, T;Wu, HK;Whitesides, GM
本文介绍了一种实用的方法，用于软光刻中使用的光掩模，母版，和邮票/模具，最大限度地减少了对专用设备的需要。在这种方法中，CAD文件首先使用分辨率为600点/英寸的办公打印机打印到纸张上。这些印刷图案的照片缩小将图像转移到35毫米胶片或缩微平片上。这些照相胶片在显影后可用作1：1接触光刻中的光掩模。有了这样的光刻胶母版，（二甲基硅氧烷）（PDMS）印模/模具，用于软光刻，该工艺可产生小至15 μ m的微结构;从CAD文件到PDMS印模的总时间为4-24小时。尽管仍然需要使用通常在洁净室中找到的设备-旋涂机和紫外线曝光工具，光掩模本身的成本很小，从概念到器件所需的时间很短。这种方法和所有其他方法之间的比较，产生薄膜型光掩模已被执行使用线，正方形和圆形的测试图案。三个微结构也被制造，以证明这种方法在实际应用中的效用。
This paper describes a practical method for the fabrication of photomasks, masters, and stamps/molds used in soft lithography that minimizes the need for specialized equipment. In this method, CAD files are first printed onto paper using an office printer with resolution of 600 dots/in. Photographic reduction of these printed patterns transfers the images onto 35-mm film or microfiche. These photographic films can be used, after development, as photomasks in 1:1 contact photolithography. With the resulting photoresist masters, it is straightforward to fabricate poly(dimethylsiloxane) (PDMS) stamps/molds for soft lithography, This process can generate microstructures as small as 15 mu m; the overall time to go from CAD file to PDMS stamp is 4-24 h, Although access to equipment-spin coater and ultraviolet exposure tool-normally found in the clean room is still required, the cost of the photomask itself is small, and the time required to go from concept to device is short. A comparison between this method and all other methods that generate film-type photomasks has been performed using test patterns of lines, squares, and circles. Three microstructures have also been fabricated to demonstrate the utility of this method in practical applications.