Plasma sources based on the propagation of electromagnetic surface waves
Plasma sources based on the propagation of electromagnetic surface waves
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DOI：
10.1088/0022-3727/24/7/001
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发表时间：
1991-07
期刊：
影响因子：
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通讯作者：
M. Moisan;Z. Zakrzewski
中科院分区：
文献类型：
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作者：
M. Moisan;Z. Zakrzewski
微波和RF等离子体在材料处理、等离子体化学、化学分析和其他领域中的应用越来越多。这刺激了寻找合适的等离子体源。在20世纪70年代，电磁表面波被用于维持等离子体，并为此开发了一种称为surfatron的高效微波设备。最近的研究表明，这种放电也可以在无线电频率下工作。表面波等离子体的实验数据已积累了大量的先进的模型，并在各个领域的研究和技术中得到应用。本文综述了表面波等离子体源的物理工作原理和设计。由于波发射器的源的核心组成部分，本文提出了一个统一的描述几个紧凑的，高效的，易于操作的发射器，专门用于等离子体生成，已在过去的15年。现在可以在从1 MHz到10 GHz的频率范围内、在从10-5托延伸到几倍大气压的压力域中以及在丰富多样的等离子体容器和反应室中维持这样的等离子体。
Microwave and RF plasmas are finding increasing use in materials processing, plasma chemistry, chemical analysis, and other fields. This is stimulating the search for suitable plasma sources. In the 1970s, electromagnetic surface waves were put to use to sustain plasmas and an efficient microwave device, called a surfatron, was developed for this purpose. Recent work has shown that such discharges can also operate at radio frequencies. A large number of on surface-wave plasmas experimental data have been accumulated-their modelling is well advanced and they have found applications in various fields of research and technology. This paper reviews the physical principles of operation and the design of surface-wave plasma sources. Since the wave launcher is the central component of the source, this review presents a unified description of several compact, efficient, and easy to operate launchers specifically intended for plasma generation that have been developed over the past fifteen years. It is now possible to sustain such plasmas at frequencies ranging from 1 MHz to 10 GHz, in a pressure domain extending from 10-5 Torr up to few times atmospheric pressure, and in a rich variety of plasma vessels and reaction chambers.