OPC methods to improve image slope and process window
OPC methods to improve image slope and process window
复制标题
改善图像斜率和处理窗口的 OPC 方法
DOI：
10.1117/12.515190
复制
发表时间：
2003
期刊：
影响因子：
--
通讯作者：
Y. Granik
中科院分区：
文献类型：
--
作者：
Nicolas B. Cobb;Y. Granik
In this paper, we use the gradient of the image slope and gradient of the edge placement error (EPE) in order to improve both slope and EPE during OPC. The EPE gradient taken with respect to edge position is normally called MEEF or more generally, the MEEF matrix. Use of the gradient of image slope with respect to change in edge position is a relatively new concept, introduced by Granik as the “contrast matrix”. Whereas traditional OPC techniques focus on EPE alone (pattern fidelity), we broaden the scope of OPC to maximize slope for improved image robustness and to maximize process window.
