Ion beams and laser postionization for molecule-specific imaging
Ion beams and laser postionization for molecule-specific imaging
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用于分子特异性成像的离子束和激光定位
DOI：
10.1021/ac00062a001
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发表时间：
1993
影响因子：
7.4
通讯作者：
Nicholas Winogard
中科院分区：
文献类型：
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作者：
Nicholas Winogard
二次离子质谱（SIMS）是一种重要的材料表面分析技术。在这种方法中，一束能量，通常具有几千电子伏的动能，被指向目标。这种抛射物将其部分动量转移到样品表面，引起离子和中性原子和分子的解吸(1)。Benninghoven和同事首先注意到分子的喷射发生在金属表面（2,3）。随着20世纪80年代早期快速原子轰击（FAB）技术的发展，这些离子束技术已经成为研究几乎任何类型的热不稳定分子的有力工具，从聚合物和肽到小分子。飞行时间（TOF）探测和基于激光的定位方法的最新进展进一步扩展了这些技术的应用。现在看来，下一个爆炸性的发展将与亚微米空间体制中的分子成像有关。在本报告中，我们回顾了这些关键的发展，并考虑了利用质谱的新成像技术的范围。
Secondary ion mass spectrometry (SIMS) is an important technique for the surface analysis of a wide variety of materials. In this method a beam of energeticions, typically with a few thousand electronvolts of kinetic en-ergy, is directed at the target. This projectile transfers some of its mo-mentum to the sample surface, caus-ing desorption of ions and neutral atoms and molecules (1). The ejection of molecules was first noted by Benninghoven and co-workers to occur from metal surfaces (2, 3). With the development of fast atom bombardment (FAB) in the early 1980s, these ion beam tech-niques have become powerful tools for the study of thermally labile mol-ecules of virtually any type, ranging from polymers and peptides to small molecules. Recent advances in time-of-flight (TOF) detection and laser-based postionization methodshave further expanded the uses of these techniques. It appears now that the next explosive development will be associated with molecular imaging in the submicrometer spatial regime. In this REPORT, we review some of these key developments and consider the scope of new imaging techniques that utilize MS.