Ultrafast Synthesis of Silica-Based Molecular Sieve Membranes in Dielectric Barrier Discharge at Low Temperature and Atmospheric Pressure
Ultrafast Synthesis of Silica-Based Molecular Sieve Membranes in Dielectric Barrier Discharge at Low Temperature and Atmospheric Pressure
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低温常压介质阻挡放电超快合成二氧化硅基分子筛膜
DOI：
10.1021/jacs.0c09433
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发表时间：
2020
影响因子：
15
通讯作者：
Tsuru Toshinori
中科院分区：
文献类型：
--
作者：
Nagasawa Hiroki;Kagawa Takahiko;Noborio Takuji;Kanezashi Masakoto;Ogata Atsushi;Tsuru Toshinori
微孔二氧化硅膜已显示出作为节能化学分离的潜在候选者的前景。在这里，我们报告的超快合成的二氧化硅膜，在几分钟的顺序，在大气压，低温等离子体。在大气压等离子体的放电区域中的直接沉积使得能够在多孔基底上立即形成薄二氧化硅层。等离子体沉积层的厚度为1.13 nm，并被限制在基板的直接表面。随着沉积温度的升高，我们观察到等离子体沉积层的无机性质的增加和膜性能的同时改善。结果表明，该膜对小分子气体如H2（>10- 6 mol m-2s-1 Pa-1）具有良好的渗透性能，H2/SF6的渗透比高达1000 ~ 6300，为硅基膜的制备提供了一种非热选择。
Microporous silica membranes have shown promise as potential candidates for energy-efficient chemical separation. Herein, we report the ultrafast synthesis of silica membranes, on the order of minutes, in atmospheric-pressure, low-temperature plasma. Direct deposition in the discharge region of atmospheric-pressure plasma enables the immediate formation of a thin silica layer on a porous substrate. The plasma-deposited layer had a thickness of ∼13 nm and was confined to the immediate surface of the substrate. With an increase in deposition temperature, we observed an increase in the inorganic nature of the plasma-deposited layer and simultaneous improvement in the membrane performance. Consequently, the resulting membranes exhibited outstanding permeance for small-sized gas molecules, such as H2(>10–6mol m–2s–1Pa–1), with a high H2/SF6permeance ratio of ∼6300, providing a nonthermal alternative for the fabrication of silica-based membranes.