Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor
Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor
复制标题
DOI：
10.1063/1.4943025
复制
发表时间：
2016-03
影响因子：
3.2
通讯作者：
Gayathri Shivkumar;Siva Sashank Tholeti;Majed A. Alrefae;T. Fisher;Alina A. Alexeenko
中科院分区：
文献类型：
--
作者：
Gayathri Shivkumar;Siva Sashank Tholeti;Majed A. Alrefae;T. Fisher;Alina A. Alexeenko
The aim of this work is to build a numerical model of hydrogen plasma inside a microwave plasma chemical vapor deposition system. This model will help in understanding and optimizing the conditions for the growth of carbon nanostructures. A 2D axisymmetric model of the system is implemented using the finite element high frequency Maxwell solver and the heat transfer solver in COMSOL Multiphysics. The system is modeled to study variation in parameters with reactor geometry, microwave power, and gas pressure. The results are compared with experimental measurements from the Q-branch of the H2 Fulcher band of hydrogen using an optical emission spectroscopy technique. The parameter γ in Funer's model is calibrated to match experimental observations at a power of 500 W and 30 Torr. Good agreement is found between the modeling and experimental results for a wide range of powers and pressures. The gas temperature exhibits a weak dependence on power and a strong dependence on gas pressure. The inclusion of a verti...
