High Temporal Resolution Ion Energy Distribution Functions in HIPIMS Discharges
High Temporal Resolution Ion Energy Distribution Functions in HIPIMS Discharges
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HIPIMS 放电中的高时间分辨率离子能量分布函数
DOI：
10.1002/ppap.200931601
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发表时间：
2009
影响因子：
3.5
通讯作者：
Mishra A
中科院分区：
文献类型：
--
作者：
Mishra A
研究了一种在沉积等离子体基底处获得高时间分辨率离子能量分布函数的方法，并将其应用于高功率脉冲磁控溅射（HIPIMS）放电中。该技术的关键是仪器端盖内离子的静电门控。为了证明该技术的性能，在HIPIMS的以下工作条件下进行了2µs时间分辨率的IEDF测量：重复频率100 Hz，脉冲宽度100µs，压力0.26 Pa，峰值功率密度2.5 kW cm−2。质谱计的孔对着圆形磁控管阴极的磁道区。Ar+离子在放电电压脉冲启动8µs后被检测到，表现出较窄的能量分布；Ti+离子在启动14µs后被检测到，表现出高达100 eV的高能尾巴。Ti+离子的时间演化表明，在脉冲启动后20µs，金属通量开始在衬底位置形成。
A technique for obtaining high time resolution ion energy distribution functions (IEDFs) at the substrate in depositing plasma has been demonstrated, and applied to a high power impulse magnetron sputtering (HIPIMS) discharge. Key to this technique is the electrostatic gating of ions inside the instrument end cap. To demonstrate the performance of this technique, IEDF measurements with a 2 µs time‐resolution have been made with the following HIPIMS operating conditions: a repetition rate of 100 Hz, a pulse width of 100 µs, a pressure of 0.26 Pa and a peak power density of 2.5 kW cm−2. The orifice of the mass spectrometer was positioned facing the racetrack region of the circular magnetron cathode. The Ar+ions were detected 8 µs after initiation of the discharge voltage pulse, exhibiting a narrow distribution of energies, while Ti+ions were detected 14 µs after the initiation, showing a high‐energy tail extending up to 100 eV. The time‐evolution of Ti+ions show that the metal flux starts to be built up at the substrate position at times 20 µs after the pulse initiation.