The Snomipede: A parallel platform for scanning near-field photolithography
The Snomipede: A parallel platform for scanning near-field photolithography
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DOI：
10.1557/jmr.2011.370
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发表时间：
2011-09
影响因子：
2.7
通讯作者：
E. ul-Haq;Zhuming Liu;Y. Zhang;S. A. Alang Ahmad;L. Wong;J. Hobbs;G. Leggett;Jason Micklefield;C. Roberts;J. Weaver
中科院分区：
文献类型：
--
作者：
E. ul-Haq;Zhuming Liu;Y. Zhang;S. A. Alang Ahmad;L. Wong;J. Hobbs;G. Leggett;Jason Micklefield;C. Roberts;J. Weaver
使用扫描近场光刻（SNP），可以在表面上以高达9 nm的分辨率对分子进行图案化[M]。蒙塔古河E. Ducker，K. S. L.冲河J. Manning，F. J. M. Rutten，M. C. Davies和G. J. Leggett，Langmuir 23（13），7328-7337（2007）]。然而，与其他扫描探针技术一样，SNP以前被认为是一个串行过程，阻碍了其在许多应用中的使用。IBM的“Millipede”通过利用并行操作的本地探测器阵列来解决这个问题。在这里，我们描述了两个仪器（Snomipedes）的建设，近场光学方法集成到平行探针范例，并承诺在宏观领域的自上而下和自下而上的制造方法的集成。两者都能够执行近场光刻与16个探针平行跨越约2毫米。仪器可以在周围和液体环境中工作，在纳米生物学的许多应用的关键。在这两种情况下，每个探头都可以单独控制写入。我们证明了脱保护的自组装单分子层的烷基硅烷与photocleavable保护基团和随后的增长的纳米结构的聚合物刷从这些nanopatterned表面的原子转移自由基聚合。
Using scanning near-field lithography (SNP), it is possible to pattern molecules at surfaces with a resolution as good as 9 nm [M. Montague, R. E. Ducker, K. S. L. Chong, R. J. Manning, F. J. M. Rutten, M. C. Davies and G. J. Leggett, Langmuir 23 (13), 7328–7337 (2007)]. However, in common with other scanning probe techniques, SNP has previously been considered a serial process, hindering its use in many applications. IBM’s “Millipede” addresses this problem by utilizing an array of local probes operating in parallel. Here, we describe the construction of two instruments (Snomipedes) that integrate near-field optical methods into the parallel probe paradigm and promise the integration of top–down and bottom–up fabrication methods over macroscopic areas. Both are capable of performing near-field lithography with 16 probes in parallel spanning approximately 2 mm. The instruments can work in both ambient and liquid environments, key to many applications in nanobiology. In both, separate control of writing is possible for each probe. We demonstrate the deprotection of self-assembled monolayers of alkylsilanes with photocleavable protecting groups and subsequent growth of nanostructured polymer brushes from these nanopatterned surfaces by atom-transfer radical polymerization.