The Role of Si Self-interstitial Atoms in the Formation of Electrically Active Defects in Reverse-Biased Silicon n + -p Diodes upon Irradiation with Alpha Particles
The Role of Si Self-interstitial Atoms in the Formation of Electrically Active Defects in Reverse-Biased Silicon n + -p Diodes upon Irradiation with Alpha Particles
复制标题
硅自填隙原子在α粒子辐照下反向偏置硅n-p二极管电活性缺陷形成中的作用
DOI:
10.1002/pssa.202100104
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发表时间:
2021
期刊:
影响因子:
--
通讯作者:
Aharodnikau D
中科院分区:
文献类型:
--
作者:
Aharodnikau D
Results of a study of changes in electrical characteristics of n+–p diodes on boron‐doped epi‐silicon induced by irradiation with alpha particles under applied reverse bias voltages are presented. It is found that the irradiation results in a significantly lower introduction rate of carrier‐compensating radiation‐induced defects (RIDs) in the space charge region of the reverse‐biased structures compared with those in the neutral base region and in similar diodes irradiated without bias. The dominant hole and electron emission signals in the capacitance transient spectra of the irradiated diodes are characterized and identified with energy levels of some known RIDs in moderately doped p‐type Si:B. Changes in concentration of the defects are monitored after postirradiation minority carrier injection and thermal treatments. It is argued that the observed effect of the reduced concentration of RIDs in the space charge regions of the diodes is related mainly to some specific features of the silicon self‐interstitials (ISi): a very strong dependence of their thermal stability on the charge state and a highly enhanced mobility in p‐type Si under minority carrier injection conditions. The activation energy of electron emission from the doubly positively charged state of ISiis determined.