Elucidating the Exceptional Passivation Effect of 0.8 nm Evaporated Aluminium on Transparent Copper Films
Elucidating the Exceptional Passivation Effect of 0.8 nm Evaporated Aluminium on Transparent Copper Films
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DOI：
10.3389/fmats.2018.00071
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发表时间：
2018-12-04
影响因子：
3.2
通讯作者：
Hatton, Ross A.
中科院分区：
文献类型：
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作者：
Bellchambers, Philip;Lee, Jaemin;Hatton, Ross A.
厚度为9 nm（类似于70个原子）且薄层电阻为
Slab-like copper films with a thickness of 9 nm (similar to 70 atoms) and sheet resistance of