Structural Study of Si(111)(2√3×2√3)R30°–Sn Surfaces
Structural Study of Si(111)(2√3×2√3)R30°–Sn Surfaces
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Si(111)(2√3×2√3)R30°–Sn表面的结构研究
DOI：
10.1143/jjap.42.5239
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发表时间：
2003
影响因子：
1.5
通讯作者：
K. Cho
中科院分区：
文献类型：
--
作者：
T. Ichikawa;K. Cho
为了弄清Si（111）（2 <$3 ×2 <$3）R30°-Sn表面高温相的结构，采用原位扫描隧道显微镜观察了表面的微观结构。研究发现高温相不是（1×1）结构而是无序相，（2 <$3 ×2 <$3）R30°结构通过新发现的高温（2 <$3 × 2 <$3）R30°结构转变为无序相，并通过从头算结构弛豫计算提出了室温下（2 <$3 ×2 <$3）R30°结构的模型。该模型能很好地解释（2 <$3 ×2 <$3）R30°结构的衍射强度、Paterson函数和扫描隧道像的特征。
In order to clarify the structure of high-temperature phase of Si(111)(2√3×2√3)R30°–Sn surfaces, in situ scanning tunneling microscopic observations were performed. The study led to important findings that the high-temperature phase is not a (1×1) structure but a disordered one and that the (2√3×2√3)R30° structure changes to the disordered one through a high-temperature (2√3×2√3)R30° structure newly found. A model for the (2√3×2√3)R30° structure at room temperature was proposed through an ab initio structure relaxation calculation, which can explain well the features of diffraction intensity, Paterson function and scanning tunneling images of the (2√3×2√3)R30° structure.