Measurement of negative‐ion‐production efficiencies and development of a dc operation sputter‐type negative ion source
Measurement of negative‐ion‐production efficiencies and development of a dc operation sputter‐type negative ion source
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负离子产生效率的测量和直流操作溅射型负离子源的开发
DOI：
10.1063/1.1142921
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发表时间：
1992
影响因子：
1.6
通讯作者：
J. Ishikawa
中科院分区：
文献类型：
--
作者：
H. Tsuji;J. Ishikawa
为了研制一种大电流重负离子源，测量了氙气中氙+溅射产生负离子的效率和电子剥离截面。Cu−的最大效率为12.1%，在5-50 keV的能量范围内，单电子分离截面为0.6-1.4 × 10−15 cm2。基于这些基础实验的结果，我们构建了一个等离子体溅射型重负离子源，等离子体的产生频率为13.56 MHz。在无电子源的情况下，得到了2.5 mA的总负离子电流，其中Cu−电流占总束流的91%。介绍了其工作特点。
For the development of a high current heavy negative ion source, the production efficiency of the negative ions by Xe+ sputtering with cesium and electron detachment cross sections in xenon gas were measured. The maximum efficiency for Cu− was 12.1% and the single‐electron detachment cross section was found to be of the order of 0.6–1.4 × 10−15 cm2 in the energy range of 5–50 keV. Based on the results of these fundamental experiments, a plasma‐sputter‐type heavy negative ion source has been constructed, in which the plasma was generated at a rf‐frequency of 13.56 MHz. A total negative ion current of 2.5 mA was obtained without electrons from the source in dc operation, and the Cu− current was detected to be 91% of the total beam. The operation characteristics are described.