Origin of C 60 surface reconstruction resolved by atomic force microscopy
Origin of C 60 surface reconstruction resolved by atomic force microscopy
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原子力显微镜解析 C 60 表面重建的起源
DOI：
10.1103/physrevb.104.205428
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发表时间：
2021
影响因子：
3.7
通讯作者：
Forcieri L
中科院分区：
文献类型：
--
作者：
Forcieri L
表面吸附影响其化学性质和电学性质。许多研究已经报道了在金属表面观察到亮的和暗的富勒烯，这表明了广泛的表面重建；然而，重建的基础机制仍然存在争议。在这里，我们报道了针尖功能化的非接触原子力显微镜测量，它明确地揭示了富勒烯在铜(111)表面以三个明确的吸附高度吸附，这与顶层空位、单原子空位和表面纳米坑的理论报告一致。使用单分子分辨率测量，我们确定了特定于每个位置的明确定义的吸附高度，证实了金属表面上存在复杂的空位模型。
Surface adsorption ofaffects its chemical and electronic properties. Numerous studies have reported observation of bright and dark fullerenes on metal surfaces that suggest extensive surface reconstruction; however, the underpinning mechanism of the reconstruction remains under debate. Here we report tip-functionalized noncontact atomic force microscope measurements which unambiguously reveal thatfullerenes adsorb with three well-defined adsorption heights on the Cu(111) surface, consistent with theoretical reports of top-layer hollow sites, single-atom vacancies, and surface nanopits. Using single-molecule resolutionmeasurements we identify well-defined adsorption heights specific to each site, confirming the presence of a complex vacancy model formonolayers on metal surfaces.