Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency
Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency
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DOI：
10.1016/j.wear.2016.05.020
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发表时间：
2016-09-15
期刊：
影响因子：
5
通讯作者：
Opletal, Tomas
中科院分区：
文献类型：
--
作者：
Janos, Pavel;Ederer, Jakub;Opletal, Tomas
采用碳酸盐和草酸盐前驱体，通过热处理制备了具有优良抛光性能的氧化铈。煅烧温度被确定为决定抛光粉的关键性能（包括抛光效率）的关键参数;相反，煅烧时间似乎不太重要。只有在高于700 ℃的温度下制备的氧化铈在材料去除率和抛光表面质量方面表现出良好的玻璃抛光能力;在1050 ℃退火的样品产生最大的抛光效率。采用X射线衍射（XRD）、扫描电镜（SEM）、透射电镜（TEM）、BET比表面积、X射线光电子能谱（XPS）等技术对抛光粉进行了表征。详细的XRD和显微镜研究表明，氧化铈的结晶度和抛光效率之间有很强的相关性，这与抛光机理的机械效应是一致的。然而，XPS测量表明，化学特性，即Ce 3+离子的存在，也发挥了重要作用，在玻璃抛光和平面化。抛光过程的机械和化学贡献都受到煅烧温度的影响。(C)2016爱思唯尔B. V.保留所有权利。
Cerium oxide with an excellent glass polishing efficiency was prepared by annealing carbonate or oxalate precursors. The temperature of calcination was identified as a critical parameter that governs the key properties, including the polishing efficiency, of the polishing powders; conversely, the time of calcination appears to be less important. Only the cerium oxides prepared at temperatures above 700 degrees C exhibited good glass polishing capabilities in terms of both the material removal rate and the quality of the polished surface; the maximum polishing efficiency was produced by the samples annealed at 1050 degrees C. Polishing powders were characterized using X-ray diffraction (XRD), advanced microscopic techniques (SEM, TEM), Brunauer-Emmett-Teller (BET) surface area, X-ray photoelectron spectroscopy (XPS) and other techniques. Detailed XRD and microscopic investigations revealed a strong correlation between the crystallinity of cerium oxide and its polishing efficiency, which is consistent with the mechanical effect of the polishing mechanism. However, XPS measurements suggest that the chemical characteristics, namely the presence of the Ce3+ ions, also play an important role in glass polishing and planarization. Both mechanical and chemical contributions to the polishing process are influenced by the calcination temperature. (C) 2016 Elsevier B.V. All rights reserved.