Characterization of laser and laser/thermal annealed semiconducting iron silicide thin films

Characterization of laser and laser/thermal annealed semiconducting iron silicide thin films
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DOI:
10.1023/a:1008908317850
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发表时间:
1999-12
期刊:
Journal of Materials Science: Materials in Electronics
影响因子:
--
通讯作者:
A. Datta;S. Kal;S. Basu;M. Nayak;A. Nath
A. Datta;S. Kal;S. Basu;M. Nayak;A. Nath
中科院分区:
其他
文献类型:
--
作者:
A. Datta;S. Kal;S. Basu;M. Nayak;A. Nath

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