Influence of magnetic layer thickness on [Fe80Ni20-O/SiO2]n multilayer thin films
Influence of magnetic layer thickness on [Fe80Ni20-O/SiO2]n multilayer thin films
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DOI：
10.1088/1674-1056/23/8/087504
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发表时间：
2014-06
影响因子：
1.7
通讯作者：
Jian-Qing Wei;H. Geng;Lei Xu;Laisen Wang;Yuanzhi Chen;G. Yue;D. Peng
中科院分区：
文献类型：
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作者：
Jian-Qing Wei;H. Geng;Lei Xu;Laisen Wang;Yuanzhi Chen;G. Yue;D. Peng
采用反应磁控溅射法制备了一系列[Fe_（80）Ni_（20）-O/SiO_2]_n多层薄膜。SiO2中间层的厚度固定为3 nm，而Fe_（80）Ni_（20）-O磁性薄膜的厚度范围为10 ~ 30 nm。所有薄膜均表现出明显的面内单轴磁各向异性。随着Fe_（80）Ni_（20）-O层厚度的增加，饱和磁化强度略有增加，但晶粒尺寸增大，磁化强度增大，软磁性能减弱。高频磁导率的表征结果表明，磁性层较薄的薄膜更适合于实际应用。当Fe_（80）Ni_（20）-O层厚度为10 nm时，多层膜的高频磁性能最好，在GHz频段的真实的磁导率为300。
In the present work, a series of [Fe80Ni20—O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of Fe80Ni20—O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the Fe80Ni20—O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of Fe80Ni20—O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.