Behaviour of fully ionized seed plasma excited by microwave
Behaviour of fully ionized seed plasma excited by microwave
复制标题
微波激发的完全电离种子等离子体的行为
DOI:
10.1109/27.557480
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发表时间:
1997
期刊:
影响因子:
--
通讯作者:
S. Kabashima
中科院分区:
文献类型:
--
作者:
T. Murakami;T. Suekane;Y. Okuno;S. Kabashima
Nonequilibrium plasmas with cesium metal vapor ionization in helium and argon gases at moderate pressures are excited with microwave power. The structures and behaviour of the seeded plasmas are experimentally examined, particularly under the condition of Full seed (cesium atoms) ionization. By cesium seeding, the minimum power sustaining the plasma is reduced markedly, and both a broad plasma observed in pure helium and unsteady filament-like plasmas in pure argon change to the steady and broad plasma locating close to the inner surface of a discharge tube, it is revealed from the electron temperature measurements that the plasma can be in the regime of full seed ionization for suitable microwave powers, where the electron density is kept almost constant. The thickness of the fully ionized seed (FIS) plasma decreases with increasing the mole fraction of cesium vapor, and is almost independent of noble gas pressure. The thickness almost coincides with the skin depth determined from the electrical conductivity almost uniform in the FIS plasma. These facts suggest that the FIS plasma will be easily produced and maintained as long as the microwave power is consumed to the electron heating.