An anti-ultrasonic-stripping effect in confined micro/nanoscale cavities and its applications for efficient multiscale metallic patterning.
An anti-ultrasonic-stripping effect in confined micro/nanoscale cavities and its applications for efficient multiscale metallic patterning.
复制标题
DOI：
10.1039/c6nr07585a
复制
发表时间：
2016-12
期刊：
影响因子：
6.7
通讯作者：
Quan Xiang;Yiqin Chen;Zhiqin Li;Kaixi Bi;Guanhua Zhang;H. Duan
中科院分区：
文献类型：
--
作者：
Quan Xiang;Yiqin Chen;Zhiqin Li;Kaixi Bi;Guanhua Zhang;H. Duan
我们报道了一种基于抗超声剥离（AUS）效应在受限微/纳米尺度腔内可靠、高效地制造从10纳米到毫米尺度的高保真金属结构的方法。利用这种AUS效应，通过超声空化诱导剥离有选择地去除模板顶部和外部蒸发的金属层，可以定义被预图图化封闭模板包围的金属结构。由于在这种多尺度图画化过程中只需要预先图画化的模板，由于减轻了邻近效应，这种基于auss的工艺可以实现更小、更可靠的等离子体纳米间隙，并允许快速制造需要微小和大型结构的多尺度金属结构。以前所未有的效率和分辨率低至十纳米尺度，利用这种基于aus效应的多尺度图像化工艺制造了各种金属结构。这种AUS效应为在等离子体和纳米间隙电子学中实际应用的大面积高分辨率金属结构的直接写入铺平了道路。
We report a method to reliably and efficiently fabricate high-fidelity metallic structures from a ten-nanometer to a millimeter scale based on an anti-ultrasonic-stripping (AUS) effect in confined micro/nanoscale cavities. With this AUS effect, metallic structures, which are surrounded by the pre-patterned closed templates, could be defined through selectively removing the evaporated metallic layer at the top and outside of the templates by ultrasonic-cavitation-induced stripping. Because only pre-patterned templates are required for exposure in this multiscale patterning process, this AUS-based process enables much smaller and more reliable plasmonic nanogaps due to the mitigated proximity effect and allows rapid fabrication of multiscale metallic structures which require both tiny and large structures. With unprecedented efficiency and resolution down to a ten-nanometer scale, various metallic structures were fabricated using this AUS-effect-based multiscale patterning process. This AUS effect paves the way for direct writing of metallic structures with a high resolution over a large area for practical applications in plasmonics and nanogap-based electronics.