Investigation of the surface chemistry of Teflon. 1. Effect of low energy argon ion irradiation on surface structure
Investigation of the surface chemistry of Teflon. 1. Effect of low energy argon ion irradiation on surface structure
复制标题
聚四氟乙烯表面化学的研究。
作者：
B. Tan;M. Fessehaie;S. Suib
用低能（0.5-3.0 ke V范围）Ar+离子处理PFA（四氟乙烯和全氟烷氧基乙烯醚共聚物）表面。分别研究了离子能量、通量和离子类型的影响。利用x射线光电子能谱研究了Ar+离子轰击对表面组成的改变。离子轰击引起表面脱氟，特别是在离子能量S2 keV处键断裂，导致不饱和交联的部分氟化网络。随着离子能量和离子影响力的增加，表面改性更为显著。快速原子轰击光谱分析表明，由于CF2、CF2CF2、CF2CF3、CF2CF2CF3和OC^ Fy质量碎片的损失，PFA表面的修饰具有严重的脱氟过程。
PFA (tetrafluoroethyleneand perfluoroalkoxyvinyl ether copolymer) surfaces were treated with low energy (0.5-3.0 ke V range) Ar+ ions. The effects of ion energy, fluence, and ion type were studied individually. Modifications of the surface composition by the Ar+ ion bombardment were studied using X-ray photoelectron spectroscopy. The ion bombardment caused surface defluorination with bond breaking particularly at ion energies S2 keV, leading to an unsaturated cross-linked, partially fluorinated network. The surface modification was found to be more dramatic with increasing ion energy and ion fluence. Fast atom bombardment spectrometry reveals that modifications of the PFA surface are characterized by severe defluorination processes due to loss of CF2, CF2CF2, CF2CF3, CF2CF2CF3, and OC^ Fy mass fragments.