Growth and characterization of diamond films on nondiamond substrates for electronic applications

Growth and characterization of diamond films on nondiamond substrates for electronic applications
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DOI：
10.1109/5.90129
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发表时间：
1991-05
期刊：
Proc. IEEE
影响因子：
--
通讯作者：
W. Zhu;B. Stoner;B. Williams;J. Glass
W. Zhu;B. Stoner;B. Williams;J. Glass
中科院分区：
其他
文献类型：
--
作者：
W. Zhu;B. Stoner;B. Williams;J. Glass

文献摘要

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综述了近年来在非金刚石衬底上化学气相沉积（CVD）金刚石薄膜及其表征的研究进展。主要的生长技术，包括热灯丝CVD;微波，RF，或DC等离子体增强CVD;和燃烧火焰生长;以及一些混合和新颖的方法，进行了描述和分析。从金刚石膜的表征，包括金刚石相识别，成核和界面现象，形态和缺陷，以及它们与电气性能的相关性的主要类别的结果进行了检查和讨论。虽然大部分的信息是同样适用于保护和耐磨涂层的应用，重点放在最相关的微电子领域。>
Recent advances in the chemical vapor deposition (CVD) and characterization of diamond films on nondiamond substrates are reviewed. Major growth techniques, including hot filament CVD; microwave, RF, or DC plasma enhanced CVD; and combustion flame growth; as well as a number of hybrid and novel approaches, are described and analyzed. Results from the major categories of diamond film characterization, including diamond phase identification, nucleation and interfacial phenomena, morphology, and defects, as well as their correlations with electrical properties, are examined and discussed. Although most of the information presented is equally applicable to protective and wear-resistant coating application, emphasis is placed in the areas most pertinent to microelectronics. >