Mirror Surface Finishing of Silicon Wafer Edge Using Ultrasonic Assisted Fixed-Abrasive CMP (UF-CMP)
Mirror Surface Finishing of Silicon Wafer Edge Using Ultrasonic Assisted Fixed-Abrasive CMP (UF-CMP)
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DOI:
10.20965/ijat.2013.p0663
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发表时间:
2013-11
期刊:
影响因子:
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通讯作者:
Yongbo Wu;W. Yang;M. Fujimoto;Li-bo Zhou
中科院分区:
文献类型:
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作者:
Yongbo Wu;W. Yang;M. Fujimoto;Li-bo Zhou