Wavelet Environment matting
Wavelet Environment matting
复制标题
小波环境抠图
DOI：
10.2312/egwr/egwr03/157-166
复制
发表时间：
2003
期刊：
影响因子：
--
通讯作者：
P. Dutré
中科院分区：
文献类型：
--
作者：
Pieter Peers;P. Dutré
在本文中，我们提出了一种获取场景环境遮罩的新方法。我们对所拍摄场景中物体的材质属性没有任何限制，并利用场景特征（例如材质属性和自阴影）来最小化记录时间并限制误差。使用阴极射线管（CRT）显示器，按照重要性顺序将小波图案发射到场景中，以高效地构建环境遮罩。这种重要性顺序是通过一个反馈回路获得的，该反馈回路利用了从先前拍摄的照片中学到的知识。一旦记录过程完成，就可以高效地在场景后面放置新的背景。
In this paper we present a novel approach for capturing the environment matte of a scene. We impose no restrictions on material properties of the objects in the captured scene and exploit scene characteristics (e.g. material properties and self-shadowing) to minimize recording time and to bound the error. Using a CRT monitor, wavelet patterns are emitted onto the scene in order of importance to efficiently construct the environment matte. This order of importance is obtained by means of a feedback loop that takes advantage of the knowledge learned from previously recorded photographs. Once the recording process is finished, new backdrops can be efficiently placed behind the scene.