The progression of interface structure through sputtered Co/Cu and Co/Pt multilayer films
The progression of interface structure through sputtered Co/Cu and Co/Pt multilayer films
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DOI：
10.1088/0953-8984/11/43/310
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发表时间：
1999-11
期刊：
影响因子：
--
通讯作者：
B. D. Fulthorpe;D. Joyce;T. Hase;A. S. Rozatian;B. Tanner;P. Grundy
中科院分区：
文献类型：
--
作者：
B. D. Fulthorpe;D. Joyce;T. Hase;A. S. Rozatian;B. Tanner;P. Grundy
The progression of interface structure through some Co/Cu and Co/Pt multilayer systems, grown on silicon and glass substrates respectively, has been studied using grazing incidence x-ray scattering. Simulations of the data shows that the interface characteristics of the Co/Cu system propagate unchanged with increasing numbers of bilayers. The interface roughness, lateral length scale and fractal dimension remain constant across the series of samples. In contrast, a reduction in the interface conformality between top and bottom surfaces with respect to increasing numbers of bilayers is observed in the Co/Pt system; however the roughness correlation between successive layers is largely maintained. Magnetization data for Co/Cu indicate that the Co layer immediately adjacent to the substrate is magnetically `dead'. This could result from mixing of the cobalt and silicon oxide species at the substrate interface.
