In-situ anisotropic growth of nickel oxide nanostructures through layer-by-layer metal oxidation
In-situ anisotropic growth of nickel oxide nanostructures through layer-by-layer metal oxidation
复制标题
通过层层金属氧化原位各向异性生长氧化镍纳米结构
DOI：
10.1016/j.scriptamat.2022.114660
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发表时间：
2022
影响因子：
6
通讯作者：
van Benthem, Klaus
中科院分区：
文献类型：
--
作者：
Qu, Boyi;van Benthem, Klaus
本研究报告的单晶氧化镍纳米结构，是由镍纳米粒子的氧化促进的单向生长。在650°C、氧分压约4 × 10−4Pa的条件下，通过原位高分辨率透射电子显微镜直接观察到NiO/Ni界面的逐层生长。NiO的各个层通过凸缘运动生长，即，断开迁移沿着氧化物/金属界面平面。氧化在界面的步骤是由氧空位迁移沿着的界面平面，而氧化物/金属界面和气相之间的交界处作为成核网站。本研究的结果表明，在内部异相界面的反应晶体生长过程中的梯田-窗台-扭结晶体生长模型的适用性。
This study reports the one-directional growth of single crystalline nickel oxide nanostructures that is facilitated by the oxidation of nickel nanoparticles. Layer-by-layer growth at the buried NiO/Ni interface was directly observed by in-situ high resolution transmission electron microscopy at 650°C in an oxygen partial pressure around 4 × 10−4Pa. Individual layers of NiO grow by ledge movement, i.e., disconnection migration along the oxide/metal interface plane. Oxidation at interfacial steps is governed by oxygen vacancy migration along the interface plane, while the junction between the oxide/metal interface and the gas phase serves as nucleation site. The results of this study demonstrate the applicability of the terrace-ledge-kink crystal growth model for reactive crystal growth processes at internal heterophase interfaces.