Characteristic of Nanoporous SiO2 Thin Film Prepared by Sol-Gel Method with Catalyst HF
Characteristic of Nanoporous SiO2 Thin Film Prepared by Sol-Gel Method with Catalyst HF
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DOI：
10.4028/www.scientific.net/msf.475-479.1733
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发表时间：
2005-01
期刊：
影响因子：
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通讯作者：
Z.W. He;X. Liu;D.Y. Xu;Qiang Su;D. Guo;Y.Y. Wang
中科院分区：
文献类型：
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作者：
Z.W. He;X. Liu;D.Y. Xu;Qiang Su;D. Guo;Y.Y. Wang
采用扫描电镜、傅里叶变换红外、HP系列分析仪和椭圆光度法研究了HF催化剂溶胶凝胶法制备的纳米多孔SiO2薄膜的特性。结果表明，HF的加入有效地调节了孔径和分布，降低了漏电流密度和介电常数。这可能与HF的弱酸性有关，它适当地控制了溶液中化学反应的速度，以及引入了强Si-F键，其具有较低的电负性和较大的体积。
The characteristic of nanoporous SiO2 thin film prepared by sol-gel method with catalyst HF was studied by scanning electron microscopy, Fourier transform infrared, HP analyzer series and ellipsometry. Results showed the incorporation of HF effectively adjusted the pore size and distribution, and lowered the leakage current density and dielectric constant. This might be related to the weak acidity of HF, which properly controlled the velocity of chemical reaction in solution, and to the introduction of strong Si-F bonds, which had the lower electronegative and the larger volume.