A UV curable resin with reworkable properties: application to imprint lithography
A UV curable resin with reworkable properties: application to imprint lithography
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DOI：
10.1039/b905188k
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发表时间：
2009-06
影响因子：
--
通讯作者：
Daisaku Matsukawa;Wakayama Hiroyuki;Kazuyuki Mitsukura;Haruyuki Okamura;Y. Hirai;M. Shirai
中科院分区：
文献类型：
--
作者：
Daisaku Matsukawa;Wakayama Hiroyuki;Kazuyuki Mitsukura;Haruyuki Okamura;Y. Hirai;M. Shirai
使用分子中具有半缩醛酯部分的双官能甲基丙烯酸酯单体来制备用于压印光刻的原始模具的塑料复制品。使用 365 nm 光进行单体的 UV 固化，使用 254 nm 光进行固化树脂的光诱导降解。
Difunctional methacrylate monomers having a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.