Design and Construction of a New Reversed Field Pinch Device with a Very Small Aspect Ratio (A˜2)
Design and Construction of a New Reversed Field Pinch Device with a Very Small Aspect Ratio (A˜2)
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一种新型极小深宽比反向场箍缩装置的设计与构建（A～2）
DOI：
10.1585/jspf.80.721
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发表时间：
2004
期刊：
影响因子：
--
通讯作者：
Y. Yagi
中科院分区：
文献类型：
--
作者：
K. Hayase;Yasuhiro Sato;S. Kiyama;H. Ashida;H. Sugimoto;Y. Yagi
设计并制作了一种具有很小纵横比（A = 2.1）的新型RFP器件。A = 2.1的纵横比远小于现有器件的纵横比（A > 3）。在这个小的A处，在归一化通量表面坐标中从轴到θ = 0.4没有出现合理的磁表面，这可能会降低核心区域中等离子体的混沌特性。也可以进行所提出的自举电流生成的检查。为此，研制了一个紧凑的高压中心线圈和一个铝制真空室（R/rw = 0.53 m/0.25 m）。最大等离子体电流设计为100 kA。该装置的建造已成功完成。在初始放电序列中，新发现了一个具有非常高的Θ值的稳定区域，其值高达1.25。
A new RFP device with a very small aspect ratio (A = 2.1) is designed and constructed. The aspect ratio of A = 2.1 is much smaller than those of existing devices (A > 3). At this small A, no rational magnetic surface appears from the axis to ψ = 0.4 in the normalized flux surface coordinate, which may reduce the chaotic properties of the plasma in the core region. The proposed examination of bootstrap current generation could also be done. For this new device, a compact and high voltage center coil and an aluminum vacuum vessel (R/rw = 0.53 m/0.25 m) are developed. The maximum plasma current is designed to attain 100 kA. The construction of the device has been completed successfully. In the initial series of discharges, a stable region with a very high Θ value up to ˜2.5 is newly found.