Ion beam extraction with ion space‐charge compensation in beam‐plasma type ion source
Ion beam extraction with ion space‐charge compensation in beam‐plasma type ion source
复制标题
束等离子体型离子源中离子空间电荷补偿的离子束提取
DOI：
10.1063/1.331573
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发表时间：
1982
影响因子：
3.2
通讯作者：
T. Takagi
中科院分区：
文献类型：
--
作者：
J. Ishikawa;F. Sano;T. Takagi
我们研制的离子束等离子体型离子源具有独特的离子束提取机制。离子束的形成与离子空间电荷补偿的电子，这是由力分布在萃取区。电子的使用是为了改善离子空间电荷效应，这可能是大电流离子束提取的障碍。离子的空间电荷被多种高能电子有效中和；即一次电子束、二次电子束和高能等离子体电子。当这些电子的离子空间电荷补偿有效时，理论上，离子束的发散被抑制，可提取离子流的空间电荷限制被放松，离子发射表面的形状得到改善。因此，即使在较低的提取电压下，也可以提取出质量良好的大电流离子束。在实验中，提取电压为1 ~ 5 kV时，电流大于0.1 A。
The beam‐plasma type ion source that we have developed has an original ion‐ beam extraction mechanism. An ion beam is formed with an ion space‐charge compensation by electrons which are distributed by force in the extraction region. The electrons are used in order to ameliorate an ion space‐charge effect, which might be an obstacle for high‐current ion‐beam extraction. The space charge of ions is effectively neutralized by many kinds of energetic electrons; that is, a primary electron beam, a secondary electron beam, and high‐energy plasma electrons. When the ion space‐charge compensation by these electrons is effective, theoretically, the divergence of an ion beam is suppressed, the space‐charge limitation of an extractable ion current is relaxed, and the shape of the ion‐emission surface is improved. Therefore, a high‐current ion beam with good quality can be extracted, even at a low‐extraction voltage. In the experiment, the current of more than 0.1 A at the extraction voltage of 1–5 kV, which was more...