Properties of Multilayered CrN/VN Films Prepared Using a Hybrid System of High-Power Impulse Magnetron Sputtering and Pulsed Magnetron Sputtering
Properties of Multilayered CrN/VN Films Prepared Using a Hybrid System of High-Power Impulse Magnetron Sputtering and Pulsed Magnetron Sputtering
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DOI：
10.1109/tps.2022.3175190
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发表时间：
2023-02
影响因子：
1.5
通讯作者：
T. Kimura;Hiroki Maeda
中科院分区：
文献类型：
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作者：
T. Kimura;Hiroki Maeda
采用反应高功率脉冲磁控溅射 (HiPIMS) 和脉冲磁控溅射混合系统在 Si 衬底上合成了不同层厚的纳米多层氮化铬 (CrN)/氮化钒 (VN) 薄膜。采用X射线衍射(XRD)、透射电子显微镜(TEM)、纳米压痕法和摩擦磨损试验研究了纳米多层CrN/VN薄膜的微观结构和性能。 XRD 结果表明，多层薄膜表现出具有（200）择优取向的纳米微晶结构，并且估计的微晶尺寸并不高度依赖于 CrN 和 VN 层厚度。与CrN单层薄膜相比，插入VN层略微降低了压应力，并且与CrN和VN单层薄膜相比，硬度增加了4-5 GPa。多层膜的摩擦系数很大程度上取决于 CrN 层的厚度，而不是 VN 层的厚度。
Nanomultilayered chromium nitride (CrN)/ vanadium nitride (VN) films with different layer thicknesses were synthesized on Si substrates using a hybrid system of reactive high-power impulse magnetron sputtering (HiPIMS) and pulsed magnetron sputtering. The microstructure and properties of the nanomultilayered CrN/VN films were investigated using X-ray diffraction (XRD), transmission electron microscopy (TEM), the nanoindentation method, and the friction wear test. The XRD results showed that the multilayered films exhibited nanocrystallite structure with a (200) preferred orientation, and the estimated crystallite size was not highly dependent on the CrN and VN layer thicknesses. Inserting the VN layers decreased the compressive stress slightly compared to that of the CrN monolayer film and increased the hardness by 4–5 GPa compared to that of the CrN and VN monolayer films. The friction coefficient of the multilayered films strongly depended on the CrN layer thickness rather than on the VN layer thickness.