Derivation of interconnect length distribution in X architecture LSIs
Derivation of interconnect length distribution in X architecture LSIs
复制标题
X架构LSI中互连长度分布的推导
DOI：
10.1109/iitc.2003.1219713
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发表时间：
2003
期刊：
影响因子：
--
通讯作者：
K. Masu
中科院分区：
文献类型：
--
作者：
H. Nakashima;N. Takagi;K. Masu
将基于Rent经验规则的互连线长度分布预测模型推广到含对角线互连线和全向互连线的X结构的互连线长度分布预测。基于新的预测模型对X架构的有效性进行了评估。
The prediction model for the interconnect length distribution (ILD) in LSIs with orthogonal interconnects based on Rent's empirical rule is extended to the prediction of ILD for the X Architecture containing diagonal interconnects and all-directional interconnects. The effectiveness of the X Architecture is evaluated based on the new prediction model.