Morphologies in solvent-annealed thin films of symmetric diblock copolymer
Morphologies in solvent-annealed thin films of symmetric diblock copolymer
复制标题
对称二嵌段共聚物溶剂退火薄膜的形貌
DOI：
10.1063/1.2219446
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发表时间：
2006-08-14
影响因子：
4.4
通讯作者：
Han, Yanchun
中科院分区：
文献类型：
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作者：
Peng, Juan;Kim, Dong Ha;Han, Yanchun
我们系统地研究了对称的聚苯乙烯-聚甲基丙烯酸甲酯嵌段共聚物（PS-b-PMMA）在不同选择性溶剂中退火后的薄膜形貌。中性溶剂蒸气退火后，观察到的表面上没有任何横向结构的梯田形态。当使用PS-选择性溶剂退火时，膜表现出宏观上平坦的无序胶束结构。而PMMA-选择性溶剂退火导致去湿的膜与分形状孔，高度有序的纳米级凹陷的区域中的未润湿的膜。此外，当降低的PMMA-选择性溶剂退火的情况下的膜的溶胀度，丘陵和山谷观察到的高度有序的纳米级球体和条纹的表面上的共存，在较高的溶胀度的情况下。不同组分的聚合物-溶剂相互作用参数的基础上的差异进行了定性解释。
We have systematically studied the thin film morphologies of symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer after annealing to solvents with varying selectivity. Upon neutral solvent vapor annealing, terraced morphology is observed without any lateral structures on the surfaces. When using PS-selective solvent annealing, the film exhibits macroscopically flat with a disordered micellar structure. While PMMA-selective solvent annealing leads to the dewetting of the film with fractal-like holes, with highly ordered nanoscale depressions in the region of undewetted films. In addition, when decreasing the swelling degree of the film in the case of PMMA-selective solvent annealing, hills and valleys are observed with the coexistence of highly ordered nanoscale spheres and stripes on the surface, in contrast to the case of higher swelling degree. The differences are explained qualitatively on the basis of polymer-solvent interaction parameters of the different components.