Depopulation of the Ag(111) Surface State Assigned to Strain in Epitaxial Films
Depopulation of the Ag(111) Surface State Assigned to Strain in Epitaxial Films
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外延膜中应变分配的 Ag(111) 表面状态的减少
DOI：
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发表时间：
1997
期刊：
影响因子：
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通讯作者：
K. Horn
中科院分区：
文献类型：
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作者：
G. Neuhold;K. Horn
Si(111)-($7ifmmode imeselse exttimesfi{}7$) 上的外延 Ag(111) 薄膜的光电发射光谱表明，与理想的 Ag(111) 表面相比，Ag(111) 中的 $overline{ensuremath{gamma}}$ 表面态在沉积在硅表面的薄膜中减少了。这被解释为表面态能量向上移动，超出费米能级，因为根据相累积模型计算，它可以通过功函数的降低部分地逆转。通过能带结构计算，这种变化归因于薄膜生长引起的银层应变。
Photoemission spectra from epitaxial Ag(111) films on Si(111)-( $7ifmmode imeselse exttimesfi{}7$) show that the $overline{ensuremath{gamma}}$ surface state in Ag(111) is depopulated in films deposited on the silicon surface when compared with ideal Ag(111) surfaces. This is interpreted as a shift of the surface state up in energy, beyond the Fermi level, since it can be partly reversed by a lowering of the work function, in accordance with phase-accumulation model calculations. This shift is ascribed, through band structure calculations, to the strain in the Ag layers induced by film growth.