Large-Area Antenna-Assisted SEIRA Substrates by Laser Interference Lithography
Large-Area Antenna-Assisted SEIRA Substrates by Laser Interference Lithography
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DOI：
10.1002/adom.201400218
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发表时间：
2014-11-01
影响因子：
9
通讯作者：
Neubrech, Frank
中科院分区：
文献类型：
--
作者：
Bagheri, Shahin;Giessen, Harald;Neubrech, Frank
利用激光干涉光刻技术制备了用于表面增强红外吸收(SEIRA)的大面积等离子体天线基板。在每个曝光过程中改变干涉条件允许对结构的几何参数进行精确控制，从而定制它们的光学响应。这项技术独立于底层晶片，能够在厘米(2)区域均匀地制备天线，在近红外和中红外光谱范围内具有可调和高质量的等离子共振。通过增强单层十八硫醇的红外振动信号，以及通过减少聚合物的特定振动模式来监测聚合物的紫外线降解，证明了这种Seira衬底的广泛适用性。由于具有大面积和快速的制造工艺，激光干涉光刻非常适合于化学、分析和生命科学中各种不同Seira应用的低成本传感平台的制备。
Laser interference lithography is utilized to fabricate large-area plasmonic antenna substrates for surface-enhanced infrared absorption (SEIRA). Changing the interference condition in each exposure process allows precise control over the geometrical parameters of the structures and thus tailoring of their optical response. Independent of the underlying wafer, the technique enables a homogeneous preparation of antennas over cm(2) areas with tunable and high-quality plasmonic resonances in the near- and mid-infrared spectral range. The broad applicability of such SEIRA substrates is demonstrated by enhancing the infrared vibrational signals of a monolayer octadecanethiol and by monitoring the ultraviolet degradation of a polymer via the decrease of its specific vibrational modes. Due to the large-area and fast fabrication process, laser interference lithography is ideally suited for the preparation of low-cost sensing platforms for a variety of different SEIRA applications in the chemical, analytical, and life sciences.