Magnetic behavior and structure of compositionally modulated Cu-Ni thin films
Magnetic behavior and structure of compositionally modulated Cu-Ni thin films
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成分调制 Cu-Ni 薄膜的磁行为和结构
DOI：
10.1103/physrevb.25.6739
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发表时间：
1982
影响因子：
3.7
通讯作者：
J. Waszczak
中科院分区：
文献类型：
--
作者：
E. Gyorgy;D. Mcwhan;J. Dillon;L. Walker;J. Waszczak
一系列调制的Cu-Ni薄膜已准备与不同的波长，$\ensuremath{\lambda}$，和振幅，$A$，组成调制。该膜在至少16 $l\ensuremath{\lambda}l $120\AA{}的范围内具有铜和镍区域之间的连贯界面，并且几个膜基本上是包含生长缺陷的单晶。一个模型的磁性行为的基础上的假设，每一层是没有显着不同的随机合金相同的组成同意的平均磁矩和居里温度的测量。这表明不存在显著的二维效应。
A series of modulated Cu-Ni films has been prepared with varying wavelength, $\ensuremath{\lambda}$, and amplitude, $A$, of the compositional modulation. The films have coherent interfaces between the copper and nickel regions over at least the range 16 $l\ensuremath{\lambda}l$ 120 \AA{} and several of the films are essentially single crystals containing growth faults. A model for the magnetic behavior based on the assumption that each layer is not significantly different from a random alloy of the same composition agrees with the measurements of the average magnetic moment and the Curie temperature. This suggests the absence of significant two-dimensional effects.